Love your off-the-wall posts
This was a while back now, I know, but I've been trawling your posts, and this one had to have a reply.
If you use very thin film aluminium interconnects, you will have to keep it totally oxygen free for the entire lifetime of the device, because although metallic aluminium conducts well, aluminium oxide is a good insulator.
If you use a thin film in the presence of oxygen, it could not be thinner than the depth of penetration of oxygen into the surface, otherwise the trace would become totally non-conductive!
Are you another instance of the amanfrommars AI, or AI simulation?
Biting the hand that feeds IT
